金属薄膜电阻率.doc

四实验测量及数据处理：数据记录表格金属薄膜电阻率测量数据记录表(溅射时间4min)膜厚d=532.8*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.35140.427-0.4250.4260.44670.542-0.540.5410.56250.682-0.6810.68150.68850.835-0.8330.8340.79950.992-0.9890.99050.95691.187-1.1841.18551.4591.806-1.8081.8072.9513.652-3.6543.6533.6434.51-4.5114.5105金属薄膜电阻率测量数据记录表(溅射时间8min)膜厚d=1065.6*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.72940.184-0.1860.1851.65180.418-0.420.4192.9650.752-0.7520.7524.641.177-1.1771.1777.9382.014-2.0152.014510.1282.57-2.572.5711.4012.893-2.8932.89313.8883.524-3.5253.524516.7034.238-4.2394.2385金属薄膜电阻率测量数据记录表(溅射时间12min)膜厚d=1598.4*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV1.8670.207-0.2070.2076.20.684-0.6840.68412.071.328-1.3291.328517.31.906-1.9051.905520.632.27-2.2722.27124.512.698-2.6982.69827.373.013-3.0153.01432.843.615-3.6153.61538.944.284-4.2884.286金属薄膜电阻率测量数据记录表(溅射时间20min)膜厚d=2664*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV4.5610.253-0.250.25158.9360.494-0.4910.492516.420.906-0.9040.90521.281.174-1.1761.17535.591.962-1.9561.95946.732.576-2.5812.578552.642.906-2.9042.90556.43.11-3.1123.11166.323.657-3.6583.6575金属薄膜电阻率测量数据记录表(溅射时间25min)膜厚d=3330*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.79840.03-0.030.031.2630.048-0.0470.04753.430.13-0.1290.12956.2790.238-0.2370.23755.4720.226-0.2240.22510.2430.423-0.4210.42213.1390.497-0.4960.496527.081.12-1.1161.11850.832.097-2.0952.096Excel处理的电压随电流变化的关系图： 由F，根据已经处理得到的V/I,代入求得F：d/mV/IF/*m5.328E-081.2372.98716E-071.0656E-070.25381.22577E-071.5984E-070.11017.97622E-082.664E-070.05526.66496E-080.0000003330.0416.18803E-08F-d的图像：五讨论：本实验中采用测量同一电流状况下的正反向电压可以减小实验的误差。六结论：由以上数据图像可得，溅射薄膜的电阻率随着膜厚的增加而减小；薄膜厚度d由公式d=kVIt给出，其中k为常数；