TFTLCD黄光制程介绍资料.pdf

IWInfo VisionPhoto IntroductionINT Array2024/11/2IVO CONFIDENTIALiwInfo VisionArray Process2024/11/2iwInfo VisionPhoto ProcessPhoto process:Coating-一Exposure-DevelopmentCoating：将光阻均匀地涂布于基板表面Exposure:由紫外线透射光罩将图形转写至光阻表面Development:利用碱性显影液符紫外线照射的光阻去除以形成图形2024/11/2iwInfo VisionThe structure of DNS SK-1100G2024/11/2IWInfo VisionCleaner introduction2024/11/2Cleaner introductioniwInfo VisionThe simple drawing of cleaner2024/11/2Cleaner introductionIWInfo VisionPhoto ProcessCleaner目的：减小接触角和减少灰尘控制参数:-E-UV clean ability-Rinse Row rate-Mist control and dry performance-Thin film condition2024/11/2Cleaner introductioniwInfo VisionThe structure of E-LIV chamber2024/11/2Cleaner introductionThe measurement of contact angleTest condition:Radiation time 80secSample PI filmIVOInfo Vision2024/11/2Cleaner introductioniwInfo VisionThe simple drawing of roller brush&AAjet rinse sectionE D cB AA:Pre WetB:BrushC:AAJETD:Middle WetE:Final RinseCDIW use J2024/11/2Cleaner introductioniwInfo VisionAAJET2024/11/2Cleaner introductioniwInfo VisionThe basic principle of inclined rinse Few nozzle Less flow rateHorizontal transfer Too many nozzles Too much flow rate2024/11/2Cleaner introductionIWInfo VisionBrush structure高密度Brush考虑大型基板在搬送中的 弯曲度 上下配置了二对Brush搬送方向通过物理方式有效地去除较大颗粒particle搬送方向.2024/11/2Cleaner introductioniwInfo VisionAir knifeAir knife Water stripper Vertical tilt 60 Horizontal tilt 602024/11/2Cleaner introductioniwInfo VisionThe dry procedure of AKStep 2The waterdrops of a substrate encl aather around the bottom corner part of an inclination.Step 3The waterdrops leave the bottom corner part,and diying is completed.2024/11/2Cleaner introductionAir KnifeIWInfo Vision2024/11/2IWInfo VisionCoater introduction2024/11/2Coater introductioniwInfo VisionDehydration bake2024/11/2Coater introductioniwInfo VisionDehydration bake2024/11/2Coater introductioniwInfo VisionPhoto Process-Adhesion Purpose:To Increase the Adhesion of Photoresist Adhesion:HMDS(Hexamethyldisilazane);(CH3)3Si2NH Key parameter:-Adhesion Method-Adhesion Time-Temperature-Exhaust Function：-Si-O-HOH2+(CH3)3Si2NH Si-O-Si-(CH3)32024/11/2Coater introductioniwInfo VisionPhoto Process-AdhesionHydrophilicOH OH OH 1IH Six-Si、/SiO O(CH3)3SiNHSi(CH3)3HydrophobicTMS TMSTMSPoor Adhesion Poor Wet Etching UndercutGood Adhesion Good Wet Etching Footing 2024/11/2Coater introductioniwInfo VisionPhoto Process-Coating Resist:-树脂(20%)-感光剂(PAC)(5%)-溶剂(75%)-添加剂2024/11/2Coater introductioniwInfo Vision目的1.将MASK上的图案转移到胶中2.在后续工艺中保护下面的材料2024/11/2Coater introductioniwInfo VisionExposure LightMaskResistSubstrateNegative TypePositive TypeDeveloping正光阻：曝光后,负光阻：曝光后,光照到部分显影后去除 光照到部分显影后保留2024/11/2Coater introductionIVOInfo Vision树脂惰性的聚合物（包括碳、氢、氧的有机高分子）基质，用于把PR中的不同材料聚在一起的黏合剂。给予PR的 机械和化学性质（黏附性、柔顺性、热稳定性）感光剂PR内的光敏成分，对光形式的辐射能，特别是紫外区,会发生光化学反映。2024/11/2Coater introductioniwInfo Vision溶剂使PR保持液体状态，对PR的化学性质 几乎没有影响添加剂专有化学品，用来控制和改变PR材料的特定化学 性质或光响应特性，包括控制PR反射率的染色剂2024/11/2Coater introductionPR的物理特性IWInfo Vision分辨率 对比度 敏感度 粘滞性 黏附性 抗蚀性 表面张力 存储和传送 沾污和颗粒2024/11/2IWInfo VisionCoater introduction-能够在玻璃基板上形成符合要求的最小 的特征图形。形成的CD越小，PR的分辨 能力和光刻系统就越好2024/11/2Coater introduction-对比度IWInfo Vision PR从曝光区域到非曝光区域的过度的陡 度对比度好对比度差GlassGlass2024/11/2Coater introductioniwInfo Vision敏感度 PR产生良好图形所需要的一定波长的最 小能量值（曲/cnf）,对于一定的曝光能量,PR的吸收量越大越好2024/11/2Coater introductionIVOInfo Vision粘滞性 一粘滞性与时间有关，会随着PR溶剂的挥 发增加。粘滞性增加，PR流动趋势变小,厚度会增加。2024/11/2Coater introductionIWInfo Vision PR与下层材料黏附之强度。如黏附性不 好，会导致表面图形的变形。2024/11/2Coater introductioniwInfo Vision抗蚀性 PR必须保持黏附性，并在蚀刻工艺中保 护下层材料。如在高温下进行处理，还 需要有热稳定性。2024/11/2Coater introductioniwInfo Vision表面张力液体中将表面分子拉向液体主体内的分 子间吸引力。2024/11/2IWInfo VisionCoater introduction 沾污和髓在PR涂布之前，要使用Filter,使沾污控 制在最小程度2024/11/2Coater introductionCoating MethodsiwInfo VisionSpin Coating Slit+Spin Coating Slit Coater2024/11/2Coater introductioniwInfo VisionSlit Coating2024/11/2IWInfo VisionExposure Introduction2024/11/2Exposure IntroductioniwInfo VisionLocations of Units2024/11/2Exposure IntroductioniwInfo VisionLayoutIlluminatorLaserHjARC SLITinterferometer XARC Forming unit Alignment Scopemercury lamp(8lY Linear Motorr7FlyEye Lens(Auto Changer)X-Mag Compensate Glass Y non-Linear Compensate GlassARC Compensate GlassY Masking Blade front 8 rear二X non-Linear Compensate GlassSuper high pressi Marking Blade Right&LeftZ-Sensor*4q、I I rnMain Body,1 yFRONT VIEWPlate Stage Y-Linear MotorAuto Leveling unit*3 Pneumatic Cushion*4HLbt-T Laser interferometer Y回 Xinear MotorMain BodyzRIGHT SIDEVIEW2024/11/2IWInfo VisionExposure IntroductionMASK（掩膜版）分类亮场掩膜版暗场掩膜版2024/11/2Exposure IntroductioniwInfo Vision材料石英：高光学透射和低温度膨胀。辂：沉积在掩膜版上的不透明材料。有时 会在辂表面形成一层氧化辂抗反射层。2024/11/2Exposure IntroductionIVOInfo VisionOperation Mode of the Console Inline modeCommunication between MPA and I/F Plate is loaded by I/F arm Standalone modeNo communication between MPA and I/F Plate is loaded by Hand Console Mode(no use)No communication between MPA and Console2024/11/2Exposure IntroductioniwInfo VisionUM06 SystemConcave mirrorArc slit illumination2024/11/2IWInfo VisionExposure IntroductionResolution of Exposure MachineResolution vs.WavelengthR=K NAR:resolution(minimal line width)K:constantA:wavelengthTFT-LCD exposure equipment Resolution 3umNA:numerical aperture2024/11/2Exposure IntroductionIWInfo VisionIllumination System光源：8千瓦超高压水银灯，2只Lamp：Standard type-750小时,Long type-1000小时波长：exposure340nm460nm g/h/i line,436nm/405nm/365nm alignment-536nm-600nm d/e line,578nm/546nm强度：可见光波长范围(nm)2024/11/2Exposure IntroductioniwInfo VisionMask/Plate AAAA:Auto Alignment自动对准，分为预对准(Pre)和精对准(Fine)两种对准：mask align to mask stage,plate align to mask 光罩对准：mask FMA mark-stage set mark 基板对准：plate alignment mark-mask TV-pre/fine mark90umMask MarkGOumjLine 6umXXask MarkMask Set Mark2024/11/2Exposure IntroductionIVOInfo VisionMask Stage架横微；明 Mask 放到mask stage彼，先由CCD(3.85X)做mask pre-alignmentj接著做mask fine alignment(由 mask alignment mark去封型mask sta穿上的set mark此勤作 由 X/Y/Theta stag完成)，完成以上勤作彼,mask sta穿上的 Lock Pads曾维FX/Y/Theta sta弟固定在mask stage上，而 mask stag是浮在mask guide及Yaw guide上的.Set mark舆mask之 隔;1 Oum.Canon mask type:Long mask(520X800,t=1 Omm),而其封鹰 在mask stage上的硬艘装置有Y pressing cylinder及mask reference pin.Mask sta弟在曝光畴只做Y方向移勤(scan).2024/11/2Exposure IntroductioniwInfo VisionPate chuck and mechanical pre-alignment sensor1.Chuck size依玻璃 大小1T做2.直放或横放暗各有3彳固pre-alignment sensor3.Mechanical pre-alignment sensor 只 做玻璃相 封位置 if 测用（touch玻璃遏绚2024/11/2Exposure IntroductionLift PinIWInfo Visionl.Uft高度:chuck表面往上算50mm（四根lift pin之的高度差 0.2mm（以下）。2.位置再现精度：O.ltnmo3.Lift stroke:55mm（上限:chuck表面往上50mm，下限:chuck表面 往下5mm,即-5mm）。4.勤作畴附0.9sec（0.2sec/由chuck下面-5mm移勤到chuck表面+停止畤0.7sec/chuck表面往上移50mm）。2024/11/2Exposure IntroductionPlate AFCiwInfo VisionAFC：Auto Focus Compensation 自动聚焦DOF：30um,在其范围内的光阻曝光显影后图形清晰如果stage（基板承载平台）平坦度超出规格,导致基板上光阻位于DOF之外，那么曝光显影后会导致CD异常。/DOF:30um2024/11/2Exposure IntroductioniwInfo VisionJob Flow in Inline ModeJob Registration/Download1程式选择iMask Loading光罩装载Plate Loading基板装载iMask Auto Alignment光罩对准Plate Auto Focus基板聚焦Plate Auto Alignment基板对准iPlate Exposure基板曝儿Plate Unloading1基板卸载Mask Unloading光罩卸载2024/11/2Exposure IntroductioniwInfo VisionOptimize-3 Action FlowFDC(Optimize-3)Plate LoadJAuto Focus(AFC)JShot 1 P2 Auto AliqnmentPlu he 卜 1JShot 4JShot 6出Shot 5P3 MeasurementExposureP2snoiisnoizsnouExposureP3JShot 4JShot 3JShot 2出Shot 1ExposureExposureu he卜二ExposureExposuresnotusnoLDsnot4Plate Unload2024/11/2IWInfo VisionDeveloper introduction2024/11/2Developer introductionIWInfo VisionDeveloper structureSubstitution rinse module Dryer module2024/11/2Developer introductioniwInfo VisionPhoto Process-Developer Purpose:To dissolve the exposure area(for positive-type resist)Key Parameter:-Dispense Method-Temperature(Developer)-Developer time-Developer Concentration2024/11/2Developer introductioniwInfo VisionPhoto Process-Developer2024/11/2Developer introductioniwInfo VisionProceeding of DevelopmentDevelopment Time(sec)2024/11/2Nagase developer recycle systemDDS(Developer Dilution System)Developer introductionIWInfo VisionDPF-4060(Developer Purification Filtration system)2024/11/2IWInfo VisionTotal pitch2024/11/2Total pitch iwInfo Vision测定座襟值以Table座腐1+Camera座檄来表现。2024/11/2iwInfo VisionMachine configurationFiber laserMicroscope测定用CCD cameraheadstage防震台ALaser auto focusGlass airChuck tableAir cylinderIWInfo Vision Laser AF(knife edge method)Near Just focus Far2024/11/2Total pitchIWInfo VisionTotal pitch layout sketch2024/11/2Total pitchIWInfo Vision12 34 56rsiQuadrantFQuadrantYXThird QFourthjadrantQuadrant4344 4546 47482024/11/2Total pitchiwInfo VisionBMArraylOOum140ummask forbidden area:370um245um20um 50um2024/11/2Total pitchiwInfo VisionData source introductionMeasurement resultFor exampleActual result：Coordinate(538.05,636.73)Coordinate(186.13,634,12)Design value(exp)5(538.00,638.00)6(186.00,638.00)7(186.00,326.50)8(538.00,326.50)PointXy50.05-1.2760.13-3.88782024/11/2Total pitchiwInfo Vision(For example)Edge Point Distance(variation)Edge Point Distance：1076997.92um-x 1275997.31 um-y and moreMeanina:Actual value-design valueEdge Poht D istancex/yActual JZy lOOumActualby lOOum-208 K-1.75-0.59-0.50i-2.34-2.69-0.56-0.65Average-1.91-054-2.52-0.61Design value(exp.)x:1076000um y:1276000um4.003.002.001.000.00-1.00*一2#!-3.00-4.00 x-varidation Trend(finMWWAy-varidation Trendtf we control.1)Spec:3um/1100mm,1300mm2)Spec:Value after calculate/per 100mm 2 which is best?P1,P2P48一代表48个测量点TP1,TP2.代表指等两点间distanceS1,S2.Shot之间relative pos.deviation2024/11/2IWInfo Vision2024/11/2