1、Omega-M200 The device is intended for cultivation of sapphire monocrystals weighing up to 38kg, with a diameter of up to 200mm and a length of up to 300mm, by the method GOI (Kyropoulos). 蓝宝石单晶炉:蓝宝石单晶生长方法为GOI法(泡生法),单晶最大重量38kg,最大直径200mm,最大长度300mm。 Characteristics Weight of the load of raw m
2、aterial in the melting pot, kg: 38. Temperature of molten material, Celsius: 2100. Hypobaric pressure in the chamber, Pa: 6x10E-5 Run of the rod, mm: 150. Working speed of the rod, mm/hour: 0,1-1,2 Power consumption, kilowatt: 60, peak- kilowatt: 80. Cooling water debit, cubic meter/hour: 3.5
3、 Inert gas debit, cubic meter/cycle: 0,2. Weight, kg 2108. 技术特征: 熔炉填料量:38 kg 熔体温度:2100摄氏度 腔内气压:6x10E-5Pa 晶棒长度:150mm 拉速:0.1-1.2 mm/hr 能耗:60 kW,峰值为80 kW 冷却水流量:3.5 m3/hr 惰性气体流量:0.2 m3/循环 重量:2108kg Additional Parameters Method of heating: resistive. Working environment: vacuum, Pa: 6х10-
4、5 The speed of the rod (the speed varies in 0,1mm/hour increments), mm/hour: - the lowest speed: 0.1 - the highest speed: 1.2 Speed of the accelerated movement of the rod, mm/hour: 20; Accuracy of maintenance of the speed of the rod, %: ±2; Rotation frequency of the rod , rotations/min: - th
5、e lowest speed:3; - the highest speed: 8. Accuracy of stabilization of voltage on the heater: - in the range from 2,5V to 5V: ±2%; - in the range from 5V to 7V: ±1%; - in the range from 7V to 10V: ±0,1%. 附加参数: 加热方式:电阻加热 工作环境:真空,6x10E-5Pa 拉速:(速度变化最小单位是0.1mm/hour), 最小值: 0.1 mm/hour
6、 最大值: 1.2 mm/hour 拉杆快升速度:6.9x10E-6m/s(25mm/hour) 拉速精度维护:±2% 拉杆转速: 最低转速:0.05转/秒 3转/分 最高速度:0.133转/秒 8转/分 加热装置电压稳定性: 在范围2.5-5V, ±2% 在范围5-7V, ±1% 在范围7-10V,±0.1% Installation requirements A shop with the following parameters of microclimate: - temperature 20±5°С; - rela
7、tive humidity below 90%; Also: - a premise of 9m2; - a sewer discharge at the floor level or lower with a conditional pass of at least 70mm; - a contour of grounding, with resistance value between the grounding bolt and any of accessible parts of the device should be 0.1ohm or lower. 安装要求
8、车间环境气候参数要求: 温度20±5℃; 相对湿度:低于90%; 面积至少9平方米; 地板平面上铺设排水道或更低的位置不小于70mm的排水道; 外壳接地,任何可以触及到的零部件同接地螺钉之间的电阻要小于0.1ohm Operational supplies: Demineralized water under a pressure of 4х105±0.5х105Pa(Pascal). Water temperature must not be higher than 20±5°С; debit of water should be 3.5 m3/hour; Ni
9、trogen gas, purified to the level required by GOST 9293-74 and supplied under 0,5х105Pa of pressure (0,5kg/cm2). The power supply of the device is realized by three-phase four-wire (with a zero wire) networks of alternating electrical current with a voltage of 380V, a frequency of 50(60)Hz. Quality standards of electrical current should meet the requirements of GOST 1.3109-87 运行供给: 水压为4x10E5 ± 0.5x10E5Pa (4±0.5kg/cm2) 的去离子水/超纯水; 水温不得高于20±5℃,水流为3.5 m3/hour; 氮气压力为0.5x10E5Pa (0.5kg/cm2),纯度符合GOST 9293-74标准; 380V,50(60)HZ三相四线交流电供电,电流标准符合GOST 1.3109-87标准。






