化学英语证书考试(PEC)化工机械术语.doc

化学英语证书考试（PEC）-化工机械术语

A
Alignment:
The proper relative position accuracy of a graphic image, on an emulsion photo resist film mask with respect to an existing graphic image on a substrate.
Alignment marks:
Images selectively placed within or without an array for either testing, aligning or both.
Angstrom(Å):
Unit definition used to define light wavelength, ultra-violet energy and x-rays; one angstrom is equivalent to 10-¹ nanometers (1.0 × 10-10 meters).
Artwork:
An accurately scaled pattern which is used with producing the technical engineering drawing artwork photo master or photo mask(s); a product consisting of an image on the stable base surface. The proper description to define artwork and must include the required specification for tone and orientation; these specifications impact subsequent photo processing operations and/or usability.
Artwork master:
An accurate one to one pattern, usually a single image, which is what is used in producing the photomask(s). The proper description defining the artwork master must include the required specification for tone & orientation; these specifications are what impact subsequent photo processing or CAD/CAM operations.
B
Background:
The surface area against which the pattern is relieved. The surface area of the background is usually much greater than the area relieved.
Backlighting:
Viewing or photographing an object by placing it between a light-source & the eye or recording medium.
Bake:
A thermal process used to dry or cure.
Base Material Layer:
The material layer onto which coating or plating is applied, and/or from which stock is selectively removed by (photochemical milling procedure) photo chemical machining; onto which a strippable photosense is applied for use with producing phototools.
Border Area:
Region areas outside the functional pattern area(s).
Border Data:
The data patterns which appear within the borders areas of phototooling; the patterns may include tooling hole bullseyes, identification, test, and registration marks.
Bullseye:
Stylized control pattern located within the borders areas of a (phototool or photomask or photo master) to assist in phototooling alignment and/or control registration.
Burn In:
To heat a printed image until the film resist coating becomes photo-sensitive etchant-resistant material or the burn in process utilized to complete fine line image developing of photoresist.
C
CAD:
Computer Aided Designing
The integration of computers and programs to design products. The output can be graphics or a file list of coordinates and commands used in cnc machines for manufacturing the products.
CAM:
Computer Aided Manufacturing.
The combined integration of cad to a cnc device is typical referred to as cam or cad/cam.
Camera Reduction:
The process involved in photographically reducing the scaled artwork size; the product produced by such a process.
Characteristic Curve:
A curve, which D is plotted against Log E resulting from photographic plates exposed to a constant light I (power intensity) for a series of time(time-scale exposures).
Chatter:
The sawtooth pattern along a cut line on artwork patterns caused by an uneven blade application while scribing the line cut.
Chemical Etching:
Selective stock removal from the base by chem etch, etching, chemmachining, electro chemical machining, or conversion of material by an electrochemical reaction procedure.

Chemical Milling:
Selective stock removal from the base by chem etch, chemical milling etchant, chemmachining, or conversion of material by an electrochemical reaction procedure.
Clean Room:
A room, with the environmental controls (temperature and humidity) are maintained plus the environment is maintained pure “clean” free of contamination by HEPA filters or some other type of (HEPA) high efficiency small particle removal filters.
CNC Machining:
Acronym CNC: computer numerical control. Prior to using a computer in controlling machine tools it was simply, NC or numerical or numeric control.
Coat:
To cover or apply onto a substrate a photo resist film material  coating as by dipping, rolling, spraying, laminating, spinning, or flow.
Compensation:

The compensation changes made in the dimensions on the master drawing from those specified on the engineering drawing allowing for chemmachining process variables, e.g., etch factor, etching undercut, etc.
Composition:
A photographic procedure, which have patterns on two separate substrates and are aligned or registered then transferred to a third substrate. This may be accomplished in conjunction with contact printing or cameras operations. The composition usually involves intermediate photo tools.
Contact Printing:
A photographic process, with images being transferred from one surface by light exposure to the photosense side of a second. The printed image orientation is dependent on the relative positioning of the surfaces; the tone is dependent on the photosensitive chemical matter used.
Coordinatograph:
An x and y coordinate photo plotting machine consisting of a fixed or rotating table & movable head, on fixed ways that is capable of precisely locating a point on a line or surface. A coordinatograph is commonly used with cut-and-strip scribe coat materials to generate artwork patterns.
Copy Camera:
Cameras adapted for enlarging, reducing, color separating, & photographic materials screening. Also referred to as a process camera.
Cosine Law:
An illumination law which indicates that the flux radiated or received in a given direction varies with the projected area of the receiver or emitter in a plane perpendicular to the flux direction.
Crease:
A line, groove, or ridge that is made by or as if by folding a pliable substance.
Cut-and-Strip:
A method for producing artwork by cutting the attern then stripping away the unwanted areas of two layers aterial, the engineering terminology “cut-and-strip” & “Cut-and-Peel” are synonymous. The preferable term is “Cut-and-Strip.”
D
Datum:
A position or element in relation to which others are determined.
Datum Line:
A line from which distances or dimensions are reckoned.
Datum Plane:
A plane from which distances or dimensions are reckoned.
Datum point:
A point used as the basis for reckoning.
Defect:
An undesirable blemish within the functional pattern or background, commonly called flecks, voids, pin holes, spurs, notches, etc.
Definition:
The fidelity of reproduction with the pattern edge relative to the original engineering master.
Density (D):
The log (1/T) where T is transparency. The value for D depends on the photo emulsion component, the magnitude power and nature of the exposure, the dev processing conditions, and the densitometer optical arrangement.
Design of Experiments: What is DOE?
DOE, Design of Experiments is a statistical method used to determine the interrelationships between two or more process variables.
Develop:
To subject photosensitive film material to a chemical treatment designed in producing a usable image from matter previously modified by radiation.
Diaz
A nonsilver, room lighting, UV sensitive coating usually on a stable transparent film substrate. diazo coatings yield mirror image with duplicate tone through contact printing and are developed in ammonia vapor. The image has high actinic density & visual transparency.
Digitizing:
Any method for reducing feature locations on a flat plane represented by digital x-y coordinates.
Dropout:
Parts electro chemical etching without tabs.
Dry:
A thermal process reducing or eliminating water or solvent.
E
Electro Chemical Machining (ECM)
ECM, Electro Chemical Machining “is based on a controlled anodic electrochemical dissolution process of the workpiece (anode) with the tool (cathode) in an electrolytic cell, during an electrolysis process”

University of Nebraska-Lincoln: General Description of Electrochemical Machining (ECM)
Embedded Particle:
A solid substance, foreign particle impressed into the material surface. (See glossary technical term: inclusion.)
Emulsion Component:
See technical glossary: photographic layers.
Emulsion Hardening:
The process inherent in the developing of layers which renders the desired image abrasion-resistant from handling.
Emulsion Side:
The film’s side or plate which has the photographic layers.
Engineering:
The practical application of scientific methods, technical principles, & mathematical processes in solving problems or engineer improvements, development, designing, manufacturing: technology systems, machines, devices, computers, engineer software, etc.
Engineering Drawing:
Engineering technical drawing representing the part.
Etch Allowance:
The total dimensional adjustment, expressed as: inches (mils) per side, incorporated into the artwork design for a photochemical machined part, compensating for the chem etching process.
Etch Allowance Band Design:
Designing artwork using this photochemical machining method for the chemical machined part whereby all shapes are outlined with a controlled line width to be etched vs. non-outlining with the results being non-controlled etched areas.
Etch Factor Definition:
Etched depth to the lateral etch ratio, or etching undercut. The proper etch factor must include the required specification for sidewall condition.
Etch Factor Rate:
Material removal rate caused by the photo etching process.
Etchant:
The chemical milling etchant involved with photo etching a component.
Etched Blank:
The pcm machined part in the flat or preformed configuration.
Etching:
Chem. dissolution of material.
Exposure (E):
The light quantity received per unit area, exposure expressed in intensity, spectral composition and duration terminology.
F
Film Sandwich:
A sandwich composed of photomasks made with flexible film materials.
fleck:
A defect in the clear background for a phototool with a black pattern or within the clear pattern for a phototool with a black background.
Fog:
See glossary engineering: photographic fog.
Foot Candle Power:
Illumination power unit equal to luminous flux density of 1 lumen per sq. ft. striking surface.
Functional Pattern:
The phototooling configuration required in obtaining the designed part.
G
Glass Sandwich:
A sandwich composed of photomasks made with rigid glass materials.
H
Halogen:
Non-metallic elements fluorine, chlorine, bromine & iodine.
Hardening:
See engineering glossary: photo resist hardening, emulsion hardening, and metal hardening.
HEPA Filters:
This acronym stands for high efficiency particulate air filter.
I
Illuminance (or Illumination):
The result of luminous flux striking a surface. In English units, 1 lumen of flux falling on one square foot area is defined as one foot-candle illumination. In metric units, 1 lumen illuminating one square meter is the definition for 1 lux. This gives a direct conversion factor 10.76 lux = 1 foot-candle.
Image:
The functional pattern representation on a substrate:
a)     drafting – as part of a master drawing or layout;
b)     optical – as projected on a screen;
c)     photographic – a photomask or the emulsion chemical on a film or plate;
d)     photo resist film – exposed and developed coating on a substrate.
Inclusions:
Undesired materials in a solid matrix.
Infrared:
Electromagnetic energy usually defined as heat in the invisible light spectrum beyond the 7600A range. Inverse Square Law: illumination law which states that the surface illumination, via a point source is proportional to the source intensity and inversely proportional to the square distance from the source and the surface.
J
THERE ARE NO (- J -) technical machining terms, terminology.
K
Keys:
See engineering tech glossary: alignment mark.
L
Lamination:
A parts series or etched blanks which are stacked and bonded with proper registration, forming a complete unit. lateral reversal: mirror image of the pattern’s geometric orientation.
Layout:
The composite patterns description, required to produce the functional pattern involving the phototooling, photo fabrication, or photo chemical machining.
Legend:
A lettering format or symbols on the part. e.g., part number, components locations, and patterns.
Light:
Electromagnetic energy defined as visible energy between 3800-7800 Angstrom range.
Lumen:
Luminous flux unit defined as total flux in a space angle of one steradin, emitted by a one candela source (one candela emits 4 or 12.57 lumens.)
Luminance (or Brightness):
Flux reflected or emitted from a surface. The measurement has english units (foot lamberts) and metric units (candelas/square meter).
Luminous Energy:
Measurement for flux flow rate. The units are in lumen seconds.
Luminous Flux:
Visible light energy flow measurement past any given point in space and is defined as the flux amount generated by a source (one candela into a solid angle of one steradian).
M
Machining:
Process involved with removing, forming, shaping, turning, reducing, finishing, milling material (any type) by various processes (chemically mill, milling machine tool, or others).
Marking:
See technical glossary: legend
Mask:

A selective barrier to the passage of radiation. Masks, metal on glass: An optical mask comprising a glass substrate selectively covered by thin, opaque metal layers, a photomask type.
Master Drawing:
The technical drawing for the etched blank whose documented dimensions include all compensations for the chemmachining process.
Metal Hardening:
A thermal, mechanical, or chemical engineering treatment used to increase the hardness of a metal.
Milling:
Process involved typically with larger area removal of material (any type) by various processes (mill chemically, mill machine tool, or others).
Misalignment:
Improper relative image positioning. Molecular dye imaging materials: A particular diazo material sensitometrically designed for phototool applications by the manufacturer.
N
Negative Acting Resist:
A resist film which is polymerized (hardened) by light, and which, after exposure and development, remains on the substrate surface involving those areas which were under the transparent photomask’s parts.
Notch:
A void; an undesirable indent within the photographic patterns edge, i.e., a clear indentation in a black pattern; a black indentation in a clear pattern.
O
Opacity:
By definition, 1/T where T is transparency.
Orientation:
Definition: The manner in which the functional pattern is to be viewed. Proper orientation requires “right reading” definition. The orientation for the various phototooling elements is described as either “right reading up” or “right reading down.”
Orthochromatic:
The emulsion silver component spectrally photo sensitive to blue, green, and yellow frequencies.
Overlay:
A film containing graphics material which is used for inspection by superimposing the film on the graphics material.
P
Panchromatic:
The emulsion silver co